Journal of Undergraduate Research 3, Chemical Vapor Deposition of Nickel Ferrite Using Ni(C5 H5 )2 and Fe(C5 H4 C4 H9 )(C5 H5 ) M. A. Kimbell Department of Electrical Engineering, Rose-Hulman Institute of Techn

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Date: 2010-02-01 15:16:36 Thin film deposition Semiconductor device fabrication Chemical vapor deposition Metalorganic vapour phase epitaxy Thin film Vacuum deposition Epitaxy X-ray photoelectron spectroscopy Atomic layer deposition Chemical vapor deposition of ruthenium		Journal of Undergraduate Research 3, Chemical Vapor Deposition of Nickel Ferrite Using Ni(C5 H5 )2 and Fe(C5 H4 C4 H9 )(C5 H5 ) M. A. Kimbell Department of Electrical Engineering, Rose-Hulman Institute of Techn Add to Reading List Source URL: jur.phy.uic.edu Download Document from Source Website File Size: 750,44 KB Share Document on Facebook