![Thin film deposition / Semiconductor device fabrication / Chemical vapor deposition / Metalorganic vapour phase epitaxy / Thin film / Vacuum deposition / Epitaxy / X-ray photoelectron spectroscopy / Atomic layer deposition / Chemical vapor deposition of ruthenium Thin film deposition / Semiconductor device fabrication / Chemical vapor deposition / Metalorganic vapour phase epitaxy / Thin film / Vacuum deposition / Epitaxy / X-ray photoelectron spectroscopy / Atomic layer deposition / Chemical vapor deposition of ruthenium](https://www.pdfsearch.io/img/c79dfaf360af332b75c0fcaa258bbaf4.jpg) Date: 2010-02-01 15:16:36Thin film deposition Semiconductor device fabrication Chemical vapor deposition Metalorganic vapour phase epitaxy Thin film Vacuum deposition Epitaxy X-ray photoelectron spectroscopy Atomic layer deposition Chemical vapor deposition of ruthenium | | Journal of Undergraduate Research 3, Chemical Vapor Deposition of Nickel Ferrite Using Ni(C5 H5 )2 and Fe(C5 H4 C4 H9 )(C5 H5 ) M. A. Kimbell Department of Electrical Engineering, Rose-Hulman Institute of TechnAdd to Reading ListSource URL: jur.phy.uic.eduDownload Document from Source Website File Size: 750,44 KBShare Document on Facebook
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