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Manufacturing / Technology / Atomic layer deposition / Ultra-high-purity steam for oxidation and annealing / Ion Layer Gas Reaction / Thin film deposition / Chemistry / Semiconductor device fabrication
Date: 2006-02-16 04:35:52
Manufacturing
Technology
Atomic layer deposition
Ultra-high-purity steam for oxidation and annealing
Ion Layer Gas Reaction
Thin film deposition
Chemistry
Semiconductor device fabrication

Minireviews M. Leskel and M. Ritala Electronic Materials

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