Photon Factory Activity Report 2009 - Quantum process - Document - PDFSEARCH.IO

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Date: 2010-12-27 22:22:07 Semiconductor device fabrication Superhard materials Transistors Ceramic materials Atomic layer deposition High-k dielectric Ruthenium(IV) oxide Silicon dioxide Titanium nitride Chemistry Matter Electronic engineering		Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Interfacial reactions for Ru metal-electrode/HfSiON gate stack structures studied Add to Reading List Source URL: pfwww.kek.jp Download Document from Source Website File Size: 506,21 KB Share Document on Facebook

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