A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning and

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Date: 2018-10-02 12:52:32 Electronic engineering Electronic design automation Digital electronics Electronics Physical design Routing Timing closure Placement Design closure Router		A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning and Add to Reading List Source URL: www.avatar-da.com Download Document from Source Website File Size: 386,37 KB Share Document on Facebook

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