Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C

First Page		Document Content
Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma physics Plasma processing Physics Manufacturing Electromagnetism Reactive-ion etching Plasma Langmuir probe Etching Capacitor Capacitively coupled plasma		Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C Add to Reading List Source URL: web.eecs.umich.edu Download Document from Source Website File Size: 211,82 KB Share Document on Facebook

	1 Fast Reciprocating Langmuir Probe (FRLP) Diagnostics Langmuir probes are standard diagnostics in tokamak to measure the plasma density, temperature, floating potential and plasma flow in the SOL and near X – points DocID: 1vl8u - View Document
	INSTITUTE OF PHYSICS PUBLISHING and INTERNATIONAL ATOMIC ENERGY AGENCY Nucl. Fusion–693 NUCLEAR FUSION doi: DocID: 1r371 - View Document
	Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C DocID: 1q0n7 - View Document
	ARTICLE Received 16 Dec 2009 \| Accepted 14 Jul 2010 \| Published 10 Aug 2010 DOI: ncomms1052 Current drive at plasma densities required DocID: 1pXpo - View Document
	Characterization and monitoring of space radiation in LEO orbit by the SATRAM/Timepix payload on board the ESA Proba-V satellite Carlos Granja1,‡, Stepan Polansky1, Stanislav Pospisil1, Alan Owens2, Karim Mellab2 1 Ins DocID: 1p91y - View Document