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Wafer / Rinse / Resist / Semiconductor device fabrication / Technology / Etching


NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual ______________________________________________ PEL Wet Station W –Non-Standard Organic Solvent Station
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Document Date: 2014-09-24 23:25:15


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File Size: 258,61 KB

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City

Bath / /

Company

Mitsubishi / /

Facility

To store / Wet Station B Wet Station / Wet Station / NANOELECTRONICS FABRICATION FACILITY / /

IndustryTerm

hot chemicals / appropriate personal protective equipment / chemical-resisted gloves / metal layer / chemical resisted gloves / chemical / wet-processing baths / chemical resisted glove / /

Person

Michael Kwok / /

/

Position

QDR Controller / waste collector / The MITSUBISH F-940GOT Controller / Senior Technician / controller / quick dump rinser controller / NFF Technician / /

Product

Mitsubishi F940GOT Temperature / /

ProvinceOrState

Ontario / /

SocialTag