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Resist / Personal protective equipment / Semiconductor device fabrication / Rinse / Wafer


NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST  Standard Operating Manual PEL Wet Station X –Clean Organic Solvent Station Version 1.0 
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Document Date: 2014-09-24 23:25:15

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File Size: 255,43 KB

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City

Bath / /

Company

Mitsubishi / Clean / MITSUBISH F-940GOT / QDR / /

Facility

Wet Station X Wet Station / station Cover / Wet Station / NANOELECTRONICS FABRICATION FACILITY / /

IndustryTerm

hot chemicals / appropriate personal protective equipment / chemical resisted gloves / chemical / wet-processing baths / chemical resisted glove / chemical bath / chemicals / /

Person

Heat On / There / Charles Tang / /

/

Position

quick dump rinse controller / The MITSUBISH F-940GOT Controller / General / Senior Technician / Controller / NFF Technician / /

Product

Mitsubishi F940GOT Temperature / /

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