Concept Demonstration of Dopant Selective Reactive Etching in Silicon Carbide Investigator(s): Dr. Robert S. Okojie (PI) RHS at NASA GRC, Dorothy Lukco Vantage Partners, LLC. At NASA GRC, and Laura Evans RXS at NASA GRC - Robert Evans - Document - PDFSEARCH.IO

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	Concept Demonstration of Dopant Selective Reactive Etching in Silicon Carbide Investigator(s): Dr. Robert S. Okojie (PI)/RHS at NASA GRC, Dorothy Lukco/Vantage Partners, LLC. At NASA GRC, and Laura Evans/RXS at NASA GRC Add to Reading List Document Date: 2014-10-17 18:20:41 Open Document File Size: 382,46 KB Share Result on Facebook Company Dorothy Lukco/Vantage Partners LLC / / IndustryTerm fabrication technology / / Organization National Aeronautics and Space Administration / / Person Laura Evans / Robert S. Okojie / / Technology 3-D / Background Technology / SiC fabrication technology / / SocialTag Technology Microtechnology Ceramic materials Etching Silicon carbide Reactive-ion etching Doping Sulfur hexafluoride Microelectromechanical systems Semiconductor device fabrication

Concept Demonstration of Dopant Selective Reactive Etching in Silicon Carbide Investigator(s): Dr. Robert S. Okojie (PI)/RHS at NASA GRC, Dorothy Lukco/Vantage Partners, LLC. At NASA GRC, and Laura Evans/RXS at NASA GRC Add to Reading List