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Electronics / Science / Ion implantation / Heterojunction / Rutherford backscattering spectrometry / Thin film / Materials science / Chemistry / Semiconductor device fabrication


Microsoft Word - 1_1 RG Elliman et al HIAS2014
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Document Date: 2014-06-23 20:08:23

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File Size: 13,27 KB

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Company

Applied Materials Inc. / RBS / Ta Hf / Molecular Physics Laboratory / /

Country

Australia / Bangladesh / /

Facility

The University of Chittagong / The Australian National University / /

IndustryTerm

non-volatile memory applications / transition-metal oxides / transition-metal oxide/suboxide heterostructures / /

Organization

Department of Physics / Research School of Astronomy and Astrophysics / Australian National University / Canberra / University of Chittagong / Chittagong / Research School of Physics and Engineering / Department of Electronic Materials Engineering / /

PublishedMedium

Astronomy and Astrophysics / /

Technology

random access / /

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