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Photolithography / Extreme ultraviolet lithography / Nanolithography / Microelectromechanical systems / Lithography / 45 nanometer / SEMATECH / Next-generation lithography / Materials science / Technology / Microtechnology


PROJECT PROFILE T409: Development and proof of concept for projection mask-less lithography (Projection-ML2) HIGH-SPEED
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Document Date: 2009-03-25 10:37:20

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File Size: 143,45 KB

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City

Berlin / Vienna / Itzehoe / /

Company

Leica Microsystems / ST / Infineon Technologies / Philips / Hertz / HIGH-SPEED COMMUNICATIONS SYSTEMS Partners / /

Continent

Europe / /

Country

Germany / United States / /

Currency

EUR / /

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Facility

CEA-LETI EQUIcon Software Fraunhofer Institute / Fraunhofer Institute / Infineon Technologies Institute / /

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IndustryTerm

technology hour / microelectronic technologies / low technologies / chipmaker medium volume devices / industrial and proof-of-concept tool / beta tools / manufacturing / e-beam / volume devices / dynamic beam-structuring device / 45nm technology node / /

Organization

Information Society / MEDEA+ Office / Infineon Technologies Institute for Microelectronics Stuttgart Ionen Mikrofabrikations Systeme Leica Microsystems Philips STMicroelectronics As / CEA-LETI EQUIcon Software Fraunhofer Institute / Fraunhofer Institute for Silicon Technology / /

Person

Joachim Doering / /

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Position

Project leader / leader / leader in a novel technology / co-operative / /

Product

ML2 / /

PublishedMedium

the Information Society / /

SportsEvent

EPL / /

Technology

semiconductor / MEMs / lithography system / Austria France Germany The Netherlands technology / system-on-chip / ML2 technology / lithography / /

URL

http /

SocialTag