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Microtechnology / Wafer / Etching / Photolithography / Self-aligned gate / Epitaxy / Isotropic etching / Integrated circuit / Ohmic contact / Semiconductor device fabrication / Materials science / Technology
Date: 2005-05-24 15:16:52
Microtechnology
Wafer
Etching
Photolithography
Self-aligned gate
Epitaxy
Isotropic etching
Integrated circuit
Ohmic contact
Semiconductor device fabrication
Materials science
Technology

Development of Fully Depleted, Back-Illuminated Charge Coupled Devices C.J. Bebek, D.E. Groom, S.E. Holland, A. Karcher, W.F. Kolbe, N.P. Palaio, N.A. Roe, B.T. Turko, and G. Wang Lawrence Berkeley National Laboratory, 1

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