![Microtechnology / Wafer / Etching / Photolithography / Self-aligned gate / Epitaxy / Isotropic etching / Integrated circuit / Ohmic contact / Semiconductor device fabrication / Materials science / Technology Microtechnology / Wafer / Etching / Photolithography / Self-aligned gate / Epitaxy / Isotropic etching / Integrated circuit / Ohmic contact / Semiconductor device fabrication / Materials science / Technology](https://www.pdfsearch.io/img/e6fea8c45fdc5c0ee4a03e296993a648.jpg) Date: 2005-05-24 15:16:52Microtechnology Wafer Etching Photolithography Self-aligned gate Epitaxy Isotropic etching Integrated circuit Ohmic contact Semiconductor device fabrication Materials science Technology | | Development of Fully Depleted, Back-Illuminated Charge Coupled Devices C.J. Bebek, D.E. Groom, S.E. Holland, A. Karcher, W.F. Kolbe, N.P. Palaio, N.A. Roe, B.T. Turko, and G. Wang Lawrence Berkeley National Laboratory, 1
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