![Microtechnology / Semiconductor device fabrication / Photolithography / Resist / Lithography / Nanotechnology / Contact lithography / SUSS MicroTec / Materials science / Technology / Nanoimprint lithography Microtechnology / Semiconductor device fabrication / Photolithography / Resist / Lithography / Nanotechnology / Contact lithography / SUSS MicroTec / Materials science / Technology / Nanoimprint lithography](https://www.pdfsearch.io/img/d20a12d8b21145413b00318c5d52b0fa.jpg)
| Document Date: 2010-11-10 09:32:57 Open Document File Size: 195,85 KBShare Result on Facebook
City Princeton / / Company Wright-Patterson Laboratory / Nanonex Corporation / / / Event Product Release / / Facility University of Massachusetts / University of Cincinnati / / / IndustryTerm chemical synthesis / nanoimprint solutions / optical devices / nano-/micro-technologies / nanoimprint lithography solutions / nanoimprint solution / / Organization University of Massachusetts / University of Cincinnati / / / Product JVC Air-Cushion Headphone/Headset / Nanonex NX2600 tool / NX-2600 tools / NX / NX-2600 / Nanonex NX2600 / / ProgrammingLanguage NIL / / ProvinceOrState New Jersey / Massachusetts / / Technology semiconductor / Air Cushion PressTM technology / lithography / ACP technology / photolithography / / URL www.nanonex.com / /
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