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Scanning probe lithography: Application of organosilane self-assembled monolayers as ultra-thin resist films Hiroyuki Sugimura Department of Materials Science and Engineering, Kyoto University, Sakyo, Kyoto, Ja
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Document Date: 2014-03-28 09:31:20

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File Size: 3,32 MB

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Company

Seiko Instruments Inc. / C-C / Nikon / /

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Facility

Kyoto University / /

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IndustryTerm

carbon network / chemical etching / chemical reaction / Chemical properties / chemical species / imaging / aqueous solution / chemical methods / microscopy technologies / gas purge / Chemical structures / /

Organization

Hiroyuki Sugimura Department of Materials Science and Engineering / Kyoto University / /

Person

Hiroyuki Sugimura / /

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Position

candidate for scanning probe lithography / /

Technology

condensation / microscopy technologies / lithography / semiconductors / 3g / photolithography / SPM technologies / electrochemical cell / /

URL

www.mtl.kyoto-u.ac.jp/groups/sugimura-g/index-E.html / /

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