Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a

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Date: 2004-09-07 14:36:00 Chemistry Materials science Electromagnetic radiation Microtechnology Photolithography Nanolithography Photoresist Electron-beam lithography Mask Ultraviolet Resist Atomic-force microscopy		Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a Add to Reading List Source URL: rogers.matse.illinois.edu Download Document from Source Website File Size: 321,13 KB Share Document on Facebook

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