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Silicide
Results: 45

#	Item
11	Surface and Interface 2C/2002S2-002 Effects of interlayer and annealing on chemical states of HfO2 gate insulators studied by photoemission spectroscopy Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:30:05 Anions Silicide Photoemission spectroscopy
12	Surface and Interface 2C/2002S2-002 Chemical reaction and metallic cluster formation by annealing-temperature control in ZrO2 gate insulator on Si Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:30:04 Annealing Silicide Photoemission spectroscopy Chemistry Physics Electrical engineering Electronic engineering High-k dielectric Transistors
13	Photon Factory Activity Report 2006 #24 Part BSurface and Interface 2C/2005S2-002 Suppression of silicidation and crystallization by atmosphere controlled annealing Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:33:38 Spectroscopy Emission spectroscopy Annealing Silicide Polycrystalline silicon Photoemission spectroscopy High-k dielectric Absorption spectroscopy Core electron Chemistry Physics Science
14	Photon Factory Activity Report 2002 #20 Part BSurface and Interface 18A/2001G205 Growth of Fe silicide films on Si(111)7x7 and Si(111)1x1-H surfaces Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:27:34 Condensed matter physics Photoemission spectroscopy Silicide Angle-resolved photoemission spectroscopy Stellar classification Electron Physics Emission spectroscopy Chemistry
15	Photon Factory Activity Report 2005 #23Part BSurface and Interface 2C/2002S2-002 Mechanism of the interfacial reaction for polycrystalline-Si /HfO2/Si gate stacks Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:32:22 Photoemission spectroscopy Polycrystalline silicon Physics Chemistry Anions Silicide
16	Photon Factory Activity Report 2006 #24 Part BSurface and Interface 19B/2006G009 Electronic States of Fe/4H-SiC Interface by SXFS Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:33:39 Ceramic materials Abrasives Superhard materials Gemstones Silicon carbide Silicide Polymorphs of silicon carbide Stellar classification Chemistry Carbides Manufacturing
17	Photon Factory Activity Report 2005 #23Part BSurface and Interface 2C/2002S2-002 Annealing-temperature dependence: Mechanism of Hf silicidation in HfO2 gate Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:32:21 Transistors Annealing Silicon monoxide High-k dielectric Layer Silicon dioxide Silicide Photoemission spectroscopy Chemistry Semiconductor device fabrication Silicon compounds
18	Photon Factory Activity Report 2004 #22 Part BSurface and Interface 2C/2002S2-002 Interfacial reaction of polycrystalline-Si /HfO2/Si gate stacks with annealing Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:31:28 Silicide Polycrystalline silicon Photoemission spectroscopy High-k dielectric Physics Sputtering Annealing Chemistry Materials science Anions
19	Photon Factory Activity Report 2006 #24 Part BSurface and Interface 18A/ 2006G007 Thickness-dependent electronic structure of Dy silicide films grown Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:33:39 Silicon monoxide Silicon compounds Anions Silicide
20	Photon Factory Activity Report 2007 #25 Part BSurface and Interface 2C/2005S2-002 Hf-silicidation reactions due to vacuum annealing for a-Si/ HfSiO(N)/ Si gate Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:34:50 Nitrides Superhard materials Materials science Thin film deposition High-k dielectric Transistors Silicide Titanium nitride Atomic layer deposition Chemistry Semiconductor device fabrication Matter

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