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SISPAD 2012, September 5-7, 2012, Denver, CO, USA Accurate Simulation of Doping-Dependent Silicide Contact Resistance Using Nano-contact Test Structure for 22nm-node and Beyond Seong-Dong Kim a, Emre Alptekin a , Sameer
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Document Date: 2013-02-12 08:39:11
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SISPAD 2012, September 5-7, 2012, Denver, CO, USA Accurate Simulation of Doping-Dependent Silicide Contact Resistance Using Nano-contact Test Structure for 22nm-node and Beyond Seong-Dong Kim a, Emre Alptekin a , Sameer