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Materials science / Matter / Epitaxy / Molecular beam epitaxy / Chemical vapor deposition / Polycrystalline silicon / Amorphous solid / Silicon on sapphire / Thin film deposition / Semiconductor device fabrication / Chemistry


Thin Solid Films[removed]–57 Hot-wire chemical vapor deposition for epitaxial silicon growth on largegrained polycrystalline silicon templates M.S. Mason*, C.M. Chen, H.A. Atwater Thomas J. Watson Laboratory of A
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Document Date: 2007-07-14 19:05:50


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City

Pasadena / /

Company

Thin Solid Films / Elsevier Science B.V. / National Renewable Energy Laboratory / /

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Facility

California Institute of Technology / National Renewable Energy Laboratory / H.A. Atwater Thomas J. Watson Laboratory of Applied Physics / /

IndustryTerm

chemical vapor deposition / minority carrier lifetimes / photovoltaic devices / photovoltaic applications / purity gas mixtures / /

Organization

California Institute of Technology / H.A. Atwater Thomas J. Watson Laboratory of Applied Physics / /

Person

C.M. Chen / Jason Holt / B. Schroder / Carol Garland / /

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Position

*Corresponding author / /

ProvinceOrState

California / /

Technology

crystallization / spectroscopy / epitaxial silicon / chemical vapor deposition / /

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