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Photoresist / Silylation / Carboxylic acid / Polymer / Fourier transform infrared spectroscopy / Ether / Ultraviolet / Infrared spectroscopy / Ester / Chemistry / Functional groups / Photolithography


POLY Fall 2000 Preprint Template
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Document Date: 2012-02-26 22:34:49

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City

Obendorf / Ithaca / /

Company

Mitsui / /

Facility

Cornell University / Cornell Center / /

IndustryTerm

carrier gas / photoresist systems / Negative-tone systems / chemical amplification scheme / microelectromechanical systems / exposure tools / industrial and scientific applications / chemical / chemical properties / wet processing / lithographic processing / gas cylinder / energy / /

Organization

School of Chemical / Department of Materials Science and Engineering / Cornell University / School of Chemical and Biomolecular Engineering / /

Person

Robert J. Ferris / Gina L. Weibel / Peter T. Nguyen / /

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Position

Major / /

ProvinceOrState

New York / S.K. / /

PublishedMedium

Green Chemistry / /

Technology

spectroscopy / microelectromechanical systems / lithography / MEMS / polymerization / /

SocialTag