C 2015 AIP Publishing LLC. / Vertex / Shimizu / Thin Solid Films / RCA / /
Continent
America / /
Country
Germany / Australia / /
Currency
USD / /
Facility
PECVD reactor / Australian National University / AK400 PECVD reactor / /
IndustryTerm
film network / metal / photoconductance tool / front metal contact / carrier lifetime / chemical bond / gas flows / chemical vapour depositions / uniform carrier concentration / chemical structure / /
MedicalTreatment
radiation / /
Organization
Research School of Engineering / Universitat / Australian National University / Canberra / /
Person
N. Posthuma / A. Descoeudres / B. Demaurex / Andrew F. Thomson / S. De Wolf / J. Poortmans / Keith R. McIntosh / C. Ballif / S. Dauwe / R. Mertens / E. Van Kerschaver / F. A. Modine / Andres Cuevas / G. E. Jellison / Jr. / Z. Charles Holman / E. Simoen / /
PublishedMedium
Applied Physics Letters / /
Technology
semiconductor / radiation / dielectric / microwave / Recombination / deposited using an AK400 microwave/radio-frequency / /
Recombination and thin film properties of silicon nitride and amorphous silicon passivated c-Si following ammonia plasma exposure Yimao Wan, Keith R. McIntosh, Andrew F. Thomson, and Andres Cuevas Citation: Applied Physi