Scanning probe lithography: Application of organosilane self-assembled monolayers as ultra-thin resist ﬁlms Hiroyuki Sugimura Department of Materials Science and Engineering, Kyoto University, Sakyo, Kyoto, Ja

First Page		Document Content
Date: 2014-05-27 00:18:05		Scanning probe lithography: Application of organosilane self-assembled monolayers as ultra-thin resist ﬁlms Hiroyuki Sugimura Department of Materials Science and Engineering, Kyoto University, Sakyo, Kyoto, Ja Add to Reading List Source URL: www.nsa.mtl.kyoto-u.ac.jp Download Document from Source Website File Size: 3,32 MB Share Document on Facebook