Deep Si Etching at the UCSB Nanofabrication Facility Silicon Deep RIE ICP – Bosch Si- DRIE - Sulfur hexafluoride - Document - PDFSEARCH.IO

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	Deep Si Etching at the UCSB Nanofabrication Facility Silicon Deep RIE/ICP – Bosch Si- DRIE Add to Reading List Document Date: 2013-01-06 22:10:49 Open Document File Size: 531,81 KB Share Result on Facebook City Fluorine / / Company Oerlikon USA Inc. / N. / / Person Release Etch / Shouliang Lai / / Position Cao / / Technology MEMS / / SocialTag Technology Etching Deep reactive-ion etching Microelectromechanical systems Glass etching Sulfur hexafluoride 9W Microtechnology Materials science Semiconductor device fabrication

Deep Si Etching at the UCSB Nanofabrication Facility Silicon Deep RIE/ICP – Bosch Si- DRIEAdd to Reading List