Semiconductor device fabrication Thin film deposition Materials science Atomic layer deposition Electrical resistivity and conductivity Plasma Coating Titanium nitride Polycrystalline silicon Chemical vapor deposition | | MATEC Web of Conferences 39 , ) DOI: m atecconf1 0 C Owned by the authors, published by EDP Sciences, 2016 Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using theAdd to Reading ListSource URL: www.matec-conferences.orgDownload Document from Source Website File Size: 1,08 MBShare Document on Facebook
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