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Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films S. M. Prokes, O. J. Glembocki, Erin Cleveland, Josh D. Caldwell, Edward Foos, Jaakko Niinistö, and Mikko Ritala Citation: Appl
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Document Date: 2014-01-21 09:33:28

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File Size: 1,49 MB

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City

Washington DC / Burlington / /

Company

roughened Ag / PEALD Ag / COMSOL Inc. / AIP Publishing / USA Laboratory / /

Country

United States / Finland / /

Currency

USD / /

/

Facility

University of Helsinki / American Institute / American Institute of Physics / /

IndustryTerm

metal / metal shell/dielectric / energy dispersive x-ray / metal nanoparticles1 / e-beam / /

NaturalFeature

Ag islands / /

Organization

American Institute of Physics / University of Helsinki / Naval Research Lab / /

Person

Park / Josh D. Caldwell / Mikko Ritala / S. M. Prokes / Erin Cleveland / Edward Foos / /

Position

Author / Executive / DeltaNu Reporter / /

PublishedMedium

Inorganic Chemistry / Applied Physics Letters / /

Region

New England / /

Technology

laser / x-ray / dielectric / lithography / /

URL

http /

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