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Materials science / Graphene / Proximity effect / Josephson effect / SQUID / Andreev reflection / Carbon nanotube / Tunnel junction / Magnetic flux quantum / Physics / Superconductivity / Condensed matter physics


Ballistic Josephson junctions in edge-contacted graphene V. E. Calado,1, ∗ S. Goswami,1, ∗ G. Nanda,1 M. Diez,2 A. R. Akhmerov,1 K. Watanabe,3 T. Taniguchi,3 T. M. Klapwijk,1, 4 and L. M. K. Vandersypen1, † 1 arXi
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Document Date: 2015-01-28 10:42:45


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City

Moscow / Dover / Delft / Amsterdam / London / /

Company

Quantum Limited / The Netherlands 3 Advanced Materials Laboratory / Idc / Komatsu / Japan 4 Laboratory / /

Country

Netherlands / Russia / /

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Event

Product Issues / /

Facility

Moscow State Pedagogical University / Delft University of Technology / National Institute / Kavli Institute of Nanoscience / /

IndustryTerm

electron gas / graphene carrier density / fixed chemical potential / metal deposition / normal metal / present devices / carrier density / Energy relaxation / highquality graphene electronics / redundant metal / graphene-superconductor devices / interference device / graphene devices / /

MusicGroup

A.R.A. / /

OperatingSystem

Fermi / /

Organization

Physics Department / Delft University of Technology / National Institute for Materials Science / Moscow State Pedagogical University / Ministry of Education / Kavli Institute of Nanoscience / /

Person

Gil-Ho Lee / Wenzhong Bao / Christian Sch / Gianni Blatter / Lei Wang / Klaus Ensslin / V. E. Calado / Paul Cadden-Zimansky / Anastasia Varlet / Urs Ledermann / Thomas Ihn / Michael Wimmer / Nat / Daniel E. Sheehy / Feng Miao / Carlos Forsythe / Pauline Simonet / S. Gueron / Sanghyun Jo / Christoph W Groth / M. Popinciuc / V / Dongchan Jeong / Katsuyoshi Komatsu / Patrick Maher / Alberto F. Morpurgo / Dmitry Abanin / Peter Rickhaus / S. Goswami / Philip Kim / Hu-Jong Lee / Hang Zhang / Yong-Joo Doh / Chun Ning Lau / Viktor Krueckl / Naomi Mizuno / Xavier Waintal / Jong Lee / Anton R Akhmerov / H. Bouchiat / C. Girit / V / Alexandre M. Zagoskin / Ivar Martin / Xu Du / Markus Weiss / Ming-Hao Liu / Andrea F. Young / Cory R. Dean / Jae-Hyun Choi / Chuan Li / James Hone / Laurent Marot / Zlatko Papi / Takashi Taniguchi / S. Autier-Laurent / Pablo Jarillo-Herrero / Dominik Bischoff / Alban L. Fauch`ere / Ivan Skachko / Kenji Watanabe / Hubert B. Heersche / Anthony Barker / Eva Y. Andrei / T. Hymel / V / Michael Tinkham / Klaus Richter / /

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Position

RT / Author / /

Product

MoRe / symmetry states / /

ProgrammingLanguage

FP / DC / /

ProvinceOrState

New York / /

Technology

lithography / Simulation / /

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