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Journal of Undergraduate Research 4, Selective Atomic Layer Deposition (SALD) of Titanium Dioxide on Silicon and Copper Patterned Substrates K. Overhage Department of Chemical Engineering, Purdue University, I
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Document Date: 2011-03-09 12:29:52
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Journal of Undergraduate Research 4, Selective Atomic Layer Deposition (SALD) of Titanium Dioxide on Silicon and Copper Patterned Substrates K. Overhage Department of Chemical Engineering, Purdue University, I