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Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409
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Document Date: 2009-11-24 11:31:03
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Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409