Thermal stability and nitrogen redistribution in the <Si) Ti W-N AI metallization scheme F. C. T. So, E. Kolawa, H. P. Kattelus,a) X.-A. Zhao,b) and M-A. Nicolet California Institute of Technology, Pasadena, California - Thermal, California - Document - PDFSEARCH.IO

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Date: 2012-12-26 10:25:15 Nitrides Superhard materials Semiconductor device fabrication Nitrogen Silicide Titanium nitride Annealing Chemical element Matter Chemistry Periodic table		Thermal stability and nitrogen redistribution in the Document is deleted from original location. Use the Download Button below to download from the Web Archive. Download Document from Web Archive File Size: 299,92 KB

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