![Chemistry / Materials science / Electromagnetic radiation / Microtechnology / Photolithography / Nanolithography / Photoresist / Electron-beam lithography / Mask / Ultraviolet / Resist / Atomic-force microscopy Chemistry / Materials science / Electromagnetic radiation / Microtechnology / Photolithography / Nanolithography / Photoresist / Electron-beam lithography / Mask / Ultraviolet / Resist / Atomic-force microscopy](https://www.pdfsearch.io/img/81ab580618941e30ef540c131d9b375d.jpg) Date: 2004-09-07 14:36:00Chemistry Materials science Electromagnetic radiation Microtechnology Photolithography Nanolithography Photoresist Electron-beam lithography Mask Ultraviolet Resist Atomic-force microscopy | | Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ aAdd to Reading ListSource URL: rogers.matse.illinois.eduDownload Document from Source Website File Size: 321,13 KBShare Document on Facebook
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