![Superhard materials / Semiconductor device fabrication / Materials science / Transistor / Gallium nitride / High electron mobility transistor / Silicon carbide / Ohmic contact / Titanium nitride / Chemistry / Nitrides / Semiconductor devices Superhard materials / Semiconductor device fabrication / Materials science / Transistor / Gallium nitride / High electron mobility transistor / Silicon carbide / Ohmic contact / Titanium nitride / Chemistry / Nitrides / Semiconductor devices](https://www.pdfsearch.io/img/3e35fe7df6f4127698af20411b284f30.jpg)
| Document Date: 2015-04-08 17:14:33 Open Document File Size: 258,27 KBShare Result on Facebook
City Au / / Company Mechatronik-Systeme gemeinnützige GmbH / IMMS GmbH / / Country Germany / / IndustryTerm 100nm-gate-length device / chemical vapor deposition / sheet carrier densities / / Organization Technische Universität Ilmenau / Institut für Mikroelektronik / / Person Wael Jatal / Mike Cooke / / Technology semiconductor / 92 Technology / radio frequency / CVD / chemical vapor deposition / / URL www.semiconductor-today.com / http /
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