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Semiconductor device fabrication / Thin film deposition / Materials science / Atomic layer deposition / Electrical resistivity and conductivity / Plasma / Coating / Titanium nitride / Polycrystalline silicon / Chemical vapor deposition
Semiconductor device fabrication
Thin film deposition
Materials science
Atomic layer deposition
Electrical resistivity and conductivity
Plasma
Coating
Titanium nitride
Polycrystalline silicon
Chemical vapor deposition

MATEC Web of Conferences 39 , ) DOI: m atecconf1 0  C Owned by the authors, published by EDP Sciences, 2016 Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the

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