Back to Results
First PageMeta Content
Chemistry / Matter / Manufacturing / Ceramic materials / Semiconductor device fabrication / Thin film deposition / Plasma processing / Anions / Chemical vapor deposition / Silicon nitride / Silicon dioxide / Plasma-enhanced chemical vapor deposition


www.afm-journal.de www.MaterialsViews.com Seung-Kyun Kang, Suk-Won Hwang, Huanyu Cheng, Sooyoun Yu, Bong Hoon Kim, Jae-Hwan Kim, Yonggang Huang, and John A. Rogers*
Add to Reading List

Document Date: 2014-07-22 13:23:02


Open Document

File Size: 1,20 MB

Share Result on Facebook
UPDATE