ultra-pure water solutions / lower pH solutions / low pH solutions / copper metal foil spectrum / wet chemical etching / copper metal cluster formation / low energy side / metal deposition / low energy region / excitation energy / chip processing / energy shift / copper metal / high-energy peak / systems involving trace metal deposition / higher pH solutions / ultra pure water solutions / chemical reaction / energy resolution / metal atoms / metal ions / chemical models / trace metal contamination / energy / metal contamination / metal / copper reference metal spectrum / energy position / chemical state / trace copper metal deposition / acidic solutions / chemical shifts / high-energy region / ultra pure water solution / copper metal foil reference / metal oxide/hydroxide / copper interconnect technology / chemical information / trace metal deposition phenomena / /
Organization
Department of Energy / Waseda University / office of Basic Energy Sciences / Stanford / /
Person
Sean Brennan / Ray Near / Katharina Baur / Andy Singh / /
Position
representative / /
Product
UPW / solution / wafer / ultra pure water solutions / /
Detection and characterization of trace element contamination on silicon wafers Andy Singh, Katharina Baur, Sean Brennan, Takayuki Homma1, Nobuhiro Kubo1, and Piero Pianetta Stanford Synchrotron Radiation Laboratory, 257