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Semiconductor device fabrication / Chemistry / Matter / Manufacturing / Thin film deposition / Atomic layer deposition / Titanium dioxide / Chemical vapor deposition / Diffusion barrier / Thin film / Titanium nitride / Crystalline silicon


Journal of Undergraduate Research 4, Selective Atomic Layer Deposition (SALD) of Titanium Dioxide on Silicon and Copper Patterned Substrates K. Overhage Department of Chemical Engineering, Purdue University, I
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Document Date: 2011-03-09 12:29:52


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File Size: 454,10 KB

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