www.afm-journal.de www.MaterialsViews.com Seung-Kyun Kang, Suk-Won Hwang, Huanyu Cheng, Sooyoun Yu, Bong Hoon Kim, Jae-Hwan Kim, Yonggang Huang, and John A. Rogers*

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Date: 2014-07-22 13:23:02 Chemistry Matter Manufacturing Ceramic materials Semiconductor device fabrication Thin film deposition Plasma processing Anions Chemical vapor deposition Silicon nitride Silicon dioxide Plasma-enhanced chemical vapor deposition		www.afm-journal.de www.MaterialsViews.com Seung-Kyun Kang, Suk-Won Hwang, Huanyu Cheng, Sooyoun Yu, Bong Hoon Kim, Jae-Hwan Kim, Yonggang Huang, and John A. Rogers* Add to Reading List Source URL: rogers.matse.illinois.edu Download Document from Source Website File Size: 1,20 MB Share Document on Facebook

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