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Manufacturing / Technology / Atomic layer deposition / Ultra-high-purity steam for oxidation and annealing / Ion Layer Gas Reaction / Thin film deposition / Chemistry / Semiconductor device fabrication


Minireviews M. Leskel and M. Ritala Electronic Materials
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Document Date: 2006-02-16 04:35:52


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City

Weinheim / /

Company

Wiley-VCH Verlag GmbH & Co. KGaA / /

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Facility

University of Helsinki / University of Oulu / University of Turku / Helsinki University of Technology / Chemistry University of Helsinki P.O. Box / /

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IndustryTerm

metal / chemical thin-film deposition techniques / basic systems / metal alkoxides / microelectronics applications / thin metal / metal precursors / Metal gates / chemical vapor deposition / metal centers / mass transportation / metal nitride barrier layers / micro-electromechanical systems / transition-metal nitrides / conventional metal chloride / metal compounds / chemical methods / /

Movie

H2O / /

NaturalFeature

MOSFET channel / /

Organization

M. Ritala Department / University of Turku / University of Helsinki / University of Oulu / Chemistry University / Helsinki University of Technology / /

Person

M. Leskel / Mikko Ritala Keywords / Mikko Ritala / M. Ritala / /

Position

Professor of inorganic chemistry / Professor / Professor of inorganic materials chemistry / postdoctoral researcher / Associate Professor / /

Technology

semiconductor / semiconductors / polymerization / dielectric / optoelectronics / random access / field-effect transistor / ALE / integrated circuits / CVD / chemical vapor deposition / /

URL

www.angewandte.org / /

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