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Science of photography / Resist / Exposure / Ultraviolet / ΔT / Technology / Physics / Time / Microtechnology / Semiconductor device fabrication / Photolithography


Cap-On Bilayer Lift-Off Process
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Document Date: 2013-01-06 22:10:47

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File Size: 85,65 KB

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Facility

University of California / /

IndustryTerm

metal / imaging / /

Movie

Page 3 4 / /

NaturalFeature

pressure=300 mT / /

Organization

University of California at Santa Barbara / Nano-Fabrication Lab. / ECE Department / /

ProvinceOrState

California / /

Technology

dielectric / Photolithography / /

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