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Materials science / Electrochemistry / Surface chemistry / Surface stress / Self-assembled monolayer / In situ / Yield / Underpotential deposition / Coating / Chemistry / Physics / Mechanics


Nanostructure Fabrication Processes Objective In this project we are developing in situ measurements relevant to the electrochemical fabrication, processing, and application of nanostructured materials and devices. Our e
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Document Date: 2012-10-02 10:06:48


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Company

AMD / Engineering Laboratory / IBM / Rohm & Haas / /

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Facility

University of Virginia / Seoul National University / Harvard University / /

IndustryTerm

microelectronic devices / microelectromechanical systems / wet chemical environments / metal alloys / memory applications / metal-electrolyte interface / electrochemical processing / on-chip / /

Organization

UCLA / University of Virginia / Harvard University / Seoul National University / African Union / Metallurgy Division / /

Person

Shin Sun Mi Hwang / Jae Wook Shin Sun Mi / Stafford Ugo Bertocci Jae Wook / Liang-Yueh Ou Yang Stafford / Carlos Beauchamp Daniel Wheeler John / Thomas P. Moffat / /

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ProvinceOrState

Virginia / /

Technology

microelectromechanical systems / MEMS / 3-D / fuel cell / /

URL

www.nist.gov/metallurgy / /

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