| Document Date: 2010-11-19 07:46:35
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City Manchester / Houston / Austin / Long Beach / / Company Cox / IEEE Authorized / Authorized / Intel / Agilent / / Country United Kingdom / / Currency USD / / / Facility WARWICK UNIVERSITY / University of Warwick / / IndustryTerm metal / mobile and digital signal processing applications / semiconductor devices / elegant solution / thin-oxide devices / present devices / metal source/drain transistors / drain devices / carrier mobility / / MusicAlbum U.K. / / Organization Semiconductor Industry Association / WARWICK UNIVERSITY / University of Warwick / Department of Physics / / Person A. Wang / P. Raskin / T. M. Chung / V / T. E. Whall / J. M. Larson / N. Breil / F. Danneville / G. Larrieu / G. Dambrine / / Position Author / Editor / d.j. / D. J. / / ProvinceOrState California / / Technology semiconductor / metal S/D Schottkybarrier MOSFET technology / DSD / semiconductor devices / microwave / field-effect transistor / simulation / Digital Object Identifier / SB-MOS technology / 65 nm CMOS technology / / URL http /
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