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Photon Factory Activity Report 2002 #20 Part BSurface and Interface 2C/2002S2002 Interfacial Chemistry of p-CVD-grown Ultrathin Si Oxynitride Films
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Document Date: 2010-01-05 10:27:35


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City

Tokyo / Hiroshima / /

Country

Japan / /

Currency

pence / /

Facility

The University of Tokyo / Hiroshima University / Photon Factory / /

IndustryTerm

higher energy / precise chemical bonding structures / hot carrier resistance / eV chemical shift / plasma-enhanced chemical vapor deposition / energy resolution / radical gas / chemical structure / chemical shift / chemical structures / energy / /

OperatingSystem

Fermi / /

Organization

University of Tokyo / Semiconductor Technology Academic Research Center / High-Energy Accelerator Organization / African Union / Department of Applied Chemistry / Hiroshima University / /

Technology

spectroscopy / CVD / chemical vapor deposition / 4 Semiconductor Technology / /

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