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Thin film deposition / Chemical elements / Semiconductor device fabrication / Coatings / Vacuum / Thin film / Sputtering / Residual gas analyzer / Pressure measurement / Chemistry / Matter / Technology


Application Note Note #03/08 Critical Reactive Sputtering Process Control with the HPQS-IP Residual Gas Analyzer
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Document Date: 2008-11-17 11:03:16


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File Size: 399,52 KB

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City

Andover / /

Company

Applied Materials GmbH & Co. KG / MKS Applications Engineering Group / MKS Instruments Inc. / /

Country

United States / /

Facility

MKS Global Headquarters / /

IndustryTerm

end product / process tool / residual gas analyzer / gas mixture containing / software displays different properties / correct sputter gas ratio / gas mixture ratio / argon sputter gas / reactive gas / real-time charts / reactive gas mix / sputter gas environment / /

Person

Juergen Grillmayer / /

/

Position

equipment controller / tool controller / Sales Engineer / magnetron power controller / controller / R&D Project Manager / /

ProvinceOrState

Massachusetts / /

Technology

Process Control / /

URL

www.mksinst.com / /

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