Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan

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Date: 2009-05-08 06:50:23		Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan Add to Reading List Source URL: www.1974eiko.co.jp Download Document from Source Website File Size: 488,91 KB Share Document on Facebook