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Chemistry / Technology / Plasma processing / Coatings / Vacuum / Chemical vapor deposition / Thin film / Plasma-enhanced chemical vapor deposition / Nanolithography / Semiconductor device fabrication / Thin film deposition / Materials science
Date: 2003-07-23 13:19:47
Chemistry
Technology
Plasma processing
Coatings
Vacuum
Chemical vapor deposition
Thin film
Plasma-enhanced chemical vapor deposition
Nanolithography
Semiconductor device fabrication
Thin film deposition
Materials science

Tools for Nanoscale Assembly of Novel Catalysts Robert F. Hicks Chemical Engineering Dept., University of California Los Angeles, CA 90095

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Source URL: www.che.caltech.edu

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