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Coatings / Manufacturing / Matter / Chemical vapor deposition / Plasma processing / Vacuum / Titanium nitride / Semiconductor device fabrication / Chemistry / Thin film deposition


Microsoft Word - CVD Co Capping Layers.doc
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Document Date: 2014-05-12 14:29:49

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File Size: 387,33 KB

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City

Fishkill / Albany / Santa Clara / /

Company

IBM / 10 Torr CVD Co / Selective CVD Co / CVD Co / Cu (b) and Co / Complete Co / Since Co / Applied Materials Inc. / /

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Event

Product Issues / /

IndustryTerm

metal oxide semiconductor / atmosphere comprising helium inert gas / chemical vapor deposition / metal cap / chemical vapor deposition technique / nanoelectronic applications / metal/post / alternate metal capping approaches / chemical-mechanical polishing / metal cap process / metal capping layer / energy / /

Person

Chao Yang / /

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Position

representative / /

Product

dielectric surface / /

ProvinceOrState

New York / California / /

Technology

semiconductor / X-ray / dielectric / chemical vapor deposition / CMP / /

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