On March 16, 2005, the Federal Circuit affirmed the district court’s summary judgment that Genus did not infringe U.S. Patents No. 6,015,590, and No. 5,916,365, which relate to sequential atomic layer deposition (ALD) - Vacuum deposition - Document - PDFSEARCH.IO

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	On March 16, 2005, the Federal Circuit affirmed the district court’s summary judgment that Genus did not infringe U.S. Patents No. 6,015,590, and No. 5,916,365, which relate to sequential atomic layer deposition (ALD) Add to Reading List Document Date: 2005-03-30 13:27:22 Open Document File Size: 176,64 KB Share Result on Facebook Company Genus Inc. / Am. Inc. / / / IndustryTerm manufacturing semiconductor devices / purge gas / flow systems / inert gas / prior art systems / inert gas purging / / Organization UN Court / / Person Arthur Sherman / Lawrence M. Sung / / / Position Chief Technology Officer / / Technology semiconductor devices / / SocialTag Vacuum Claim Physics Dimension Mechanical engineering Pumps Vacuum pump Inert gas

On March 16, 2005, the Federal Circuit affirmed the district court’s summary judgment that Genus did not infringe U.S. Patents No. 6,015,590, and No. 5,916,365, which relate to sequential atomic layer deposition (ALD) Add to Reading List