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Materials science / Physics / Vacuum / Ceramic materials / Surface chemistry / Low-energy ion scattering / Low-energy electron diffraction / Ultra-high vacuum / Chemical vapor deposition / Chemistry / Science / Scientific method


doi:[removed]j.apsusc[removed]
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Document Date: 2013-11-25 13:35:03

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File Size: 273,56 KB

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City

Washington / DC / /

Company

Nashua / Ref / UPS / Silicon Sense Inc. / Naval Research Laboratory / Elsevier B.V. / the AES / /

Currency

pence / /

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Facility

Daniel Webster Highway / /

IndustryTerm

metal / chemical cleaning / in situ chemical process / pass energy / electron energy loss / wet-chemical methods / reported high-resolution electron energy loss data / low-pressure chemical vapor deposition / buried metal layer / diagnostic tools / wet-chemical cleaning procedure / in situ chemical method / energy loss / electronic devices / energy loss spectra / higher energy / numerical processing / chemical vapor deposition / stainless-steel sampling / chemical treatment / chemical / chemical inertness / chemical methods / energy loss spectroscopy / ion energy / energy / buffered oxide etch solution / /

MarketIndex

nm to determine the / /

MusicGroup

Si3N4 / MCT / /

OperatingSystem

DOS / /

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Position

applica* Corresponding author / Prime Minister / Major / /

Product

Mg Ka1 / obtained using the Mg Ka1 / 2 line / /

ProgrammingLanguage

DC / /

ProvinceOrState

South Dakota / New Hampshire / /

Technology

semiconductors / X-ray / spectroscopy / simulation / integrated circuits / CVD / chemical vapor deposition / thermal desorption / /

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