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Statistical theory / Error / Regression analysis / Errors and residuals in statistics / Normal distribution / Accuracy and precision / Variance / Standard deviation / Parameter / Statistics / Measurement / Data analysis


IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 21, NO. 1, FEBRUARY[removed]VARIUS: A Model of Process Variation and Resulting Timing Errors for Microarchitects
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Document Date: 2008-08-29 19:20:16


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File Size: 2,24 MB

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City

Cambridge / Shockley / New York / /

Company

Friedberg / IBM / ON SEMICONDUCTOR / AMD / SEMICONDUCTOR MANUFACTURING / McGraw-Hill / Intel / /

Country

Japan / United Kingdom / /

Currency

USD / /

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Event

Business Partnership / /

Facility

University of Illinois / /

Holiday

Assumption / /

IndustryTerm

deep submicron technologies / technology scales / nanometer technologies / bank / technology generation / supply distribution network / Variation makes designing processors / technology generations / alpha power law / individual chip / possible applications / processor chip / /

Organization

Defense Advanced Research Projects Agency / University of Illinois / National Science Foundation / Department of Computer Science / Cambridge Univ. / /

Person

Jun Nakano / C. Spanos / Y. Cao / J. Rabaey / Abhishek Tiwari / J. Cain / Brian Greskamp / J. Xiong / V / R. Wang / Using Shockley Model / /

Position

A. General / driver / model for process variation / representative / model / Cao / /

Product

Opteron / /

PublishedMedium

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING / /

Technology

alpha / 32-nm technology / deep submicron technologies / 32-nm technologies / Variation makes designing processors / mean chip / individual chip / nanometer technologies / processor chip / Opteron processor / simulation / SRAM / Digital Object Identifier / pdf / integrated circuit / /

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