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Health / Cleaning / Contamination control / Safety / Security / Wafer / Ultraviolet / Plasma cleaning / Cleanliness / Semiconductor device fabrication / Hygiene / Prevention


T N O Int e r n ation a l C e nt r e f o r C onta m in ation C ont r o l X nm Node Backside substrate cleaning test bench.
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Document Date: 2015-07-17 03:46:29


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File Size: 2,38 MB

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Continent

Europe / /

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IndustryTerm

diagnostic tools / nm node manufacturing / cluster tool / manufacturing prevention / dry backside substrate cleaning technology / ultra-clean handling equipment / system solutions / semiconductor manufacturing / front-end processing equipment / hydrocarbon contamination monitoring technology / in-situ hydrocarbon removal technology / eUV mask infrastructure / business to business / front-end process equipment / /

Organization

TNO International Centre for Contamination Control / European Union / CONTaCT TNO International Centre for Contamination Control Stieltjesweg / International Centre for Contamination Control / /

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Technology

semiconductor / dry backside substrate cleaning technology / In-situ hydrocarbon contamination monitoring technology / in-situ hydrocarbon removal technology / /

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