Back to Results
First PageMeta Content
Sputtering / Chemistry / Thin film / Manufacturing / Semiconductor device fabrication / Thin film deposition / Optical coating / Materials science / Thin films / Coatings


Surface and Interface 16A1/2002S2003 Analysis of X-ray reflectivity from sputtered carbon thin films (1) Consideration of density gradient
Add to Reading List

Document Date: 2010-01-05 10:30:38

Open Document

File Size: 75,98 KB

Share Result on Facebook

Country

Japan / /

/

Facility

Kenji SAKURAI* National Institute / /

IndustryTerm

chemical composition / feasible routine tool / /

Organization

Kenji SAKURAI* National Institute for Materials Science / /

Person

S. Takahashi / /

Product

C-50 / /

Technology

X-ray / /

SocialTag