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Extreme ultraviolet lithography / Reflectivity / Silicon nitride / Ultraviolet / X-ray reflectivity / Gadolinium / R-value / Chemistry / Matter / Physics


Performance optimization of Si/Gd extreme ultraviolet multilayers David L. Windt,1,* Jeffrey A. Bellotti,1 Benjawan Kjornrattanawanich,2
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Document Date: 2009-10-01 09:55:08

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File Size: 1,11 MB

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City

Washington / D.C. / Sunnyvale / Upton / New York / Washington / /

Company

USA 3 Naval Research Laboratory / Naval Research Laboratory / Brookhaven National Laboratory / Ge / Toho / Optics LLC / /

Country

United States / /

Currency

USD / /

Facility

B. E. Weir / /

IndustryTerm

high-resolution solar imaging / extreme-ultraviolet imaging telescope / solar physics applications / energy range / gas pressure / spectroscopy applications / multilayer systems / scientific and industrial applications / gas mixture / monochromatic imaging / sputter gas mixture / imaging / monochromatic imaging using telescopes / sputter gas / extreme-ultraviolet imaging spectrometer / /

Organization

SoHO mission / IMD / Optical Society of America / African Union / Optical Society of America OCIS / Universities Space Research Association / National Aeronautics and Space Administration / Solar-B mission / /

Person

Jeffrey A. Bellotti / D. J. Michels / David L. Windt / R. Kreplin / L. Van Dessel / /

Position

*Corresponding author / /

Product

Si/Gd multilayer system / Si/Gd / /

ProgrammingLanguage

DC / /

ProvinceOrState

California / New York / D.C. / /

Technology

radiation / X-ray / spectroscopy / lithography / measured using synchrotron radiation / /

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