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X-ray reflectivity / Science / National Institute of Standards and Technology / Atomic layer deposition / Metrology / Thin film / Wafer / Chemistry / Manufacturing / Thin film deposition / Semiconductor device fabrication / Optics


Objective Our goal is to develop Standard Reference Materials (SRMs) and quantitative, reproducible X-ray reflectometry (XRR) data analysis methods to enable accurate measurement of film thickness, roughness, and density
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Document Date: 2012-10-04 11:43:22


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City

Denver / /

Company

Engineering Laboratory / NIST / Diebold / ISMI Advanced CD Metrology Advisory Group / International SEMATECH Manufacturing / /

Country

United States / /

Currency

USD / /

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Event

Business Partnership / /

Facility

XRR laboratory / /

IndustryTerm

microelectronic devices / smooth deposition processing / measurement tools / manufacturing / Online Proceedings / technology transfers / analysis software / /

NaturalFeature

Jordan Valley / /

Organization

Ceramics Division / /

Person

David L. Gil / James P. Cline Albert Henins David / L. Gil Windover / Donald Windover / /

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Product

SI / /

Technology

semiconductor / X-ray / /

URL

www.nist.gov/ceramics / /

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